Oil-free operation. Excellent chemical compatibility. Robust Design.

The new MPC 303 Z chemically resistant diaphragm vacuum pump utilises a modern and robust pump design suitable for most drying applications ideal for use with vacuum ovens and rotary evaporators. Its new pump design incorporates single piece moulded diaphragms that improve the pumps efficiency giving quiet operation with minimal vibrations, improved vacuum levels, easier cleaning and extended service intervals.

The unit’s market-leading design uses PTFE and other fluoropolymers for all wetted parts to ensure that the pump is fully chemically resistant against aggressive solvents and acidic vapours.

The MPC 303 Z with flow rates of 33L/min and pressure to 5mbar has a higher pumping speed in the critical working range (20 mbar), which gives a performance more in line with a three stage diaphragm pump. This ensures your process quickly reaches the required vacuum level used for final drying of samples, moisture removal or outgassing cycling applications.

The pump unit benefits from a compact, lightweight design that allows minimal bench space usage and along with its quiet operation makes MPC 303 Z the essential chemistry diaphragm pump for many vacuum applications.

• PTFE moulded diaphragm for superior chemical resistance
• Integrated gas ballast valve for pumping condensable vapours
• Improved pumping speeds and pressure to 5mbar
• Compact design + light weight and portable
• Switchable DN 16 KF flange / DN 8 hose nozzle for inlet
• 33L/min Flow Rate
• Pressure to 5mbar